In recent times, Nanoimprint lithography has been developing at an extraordinary rate with the advancements of the same in the academic and industrial realm. Over the efforts of the last few years, several lithographic techniques have been progressed. This includes electron beam lithography, photolithography, and nanoimprint lithography to name a few. Through these techniques, the utilities derived are mentioned below.

High resolution

The high resolution is obtained with the mold’s mechanical constancy and endurance to distortion at high pressures and even in high temperatures. Usually, the high-temperature factor allows them with high resolution. High-temperature Nanoimprinting is accomplished using brittle and expensive molds obtained from inorganic materials. Recent studies attempted to utilize plastic as an alternative resource for the same purpose but due to its soft nature, it is difficult for it to resist high temperatures.


With the assistance of the fabrication infrastructure of the semiconductor industry, photonics applications are increasing and developing on a rapid scale. Nano lithography enables the whole process to be cost-effective. The development of photonic devices also would be highly subjective to the Nanoscale management of light. More advanced technology like optical sensors advantage out of this as it permits the implementation to be extensively advanced by modeling the spectral response of absorption, transmission, and reflectance. Further, to allow more proper usage of technology, light manipulation can be fitted in many ways. This includes utilizing structures such as photonic crystals, gratings, phase-shift structures, and waveguides, which permit photonic operations to be applied on a single chip.

Minimize limitations of current lithographic techniques

The issue of the constant fast shrinking of feature size caused the experts to pursue substitute modeling approaches as the typical photolithography happens with its intrinsic resolution restrict. Keeping this in mind, some assuring methods have been planned as next-generation lithography (NGL) that has the capacities to attain high-volume production and incredibly high resolution as well. With this constant growth, it ensures that it has the potential to minimize the limitation of the currently developed lithographic methods.

The usefulness of nanoimprint technology is not restricted to just one aspect but involves many. The wide range of aspects includes optical devices, photovoltaics, LEDs, and even laser diodes. Nanoscale fabrication technique and Nanoimprint lithography has been studied extensively due to its significant role in modeling Nanosized devices. With recent developments, it is certain that it will grow and reach more prominence in the upcoming years.